Mr. Chin, also 38, in September downgraded Photronics Inc., a company that makes products called reticles and photomasks that help trace patterns of circuitry on semiconductor wafers. ❋ Unknown (2009)
PLAB is a manufacturer of photomasks, which are precision photographic quartz plates containing microscopic images of electronic circuits.
A key element in the manufacture of semiconductors and flat panel displays, photomasks are used to transfer circuit patterns onto semiconductor wafers and flat panel substrates during the fabrication of integrated circuits, a variety of flat panel displays and, to a lesser extent, other types of electrical and optical components.
Through its automation, MaskCompose helps enable seamless execution of multiple, critical steps in reticle and wafer synthesis, implementation, and documentation of data-intensive and expensive photomasks and wafer stepper layouts.
UTEK develops, manufactures and markets photolithography equipment designed to reduce the cost of ownership for manufacturers of integrated circuits, including advanced packaging processes, photomasks, thin film magnetic recording devices and micromachined components. ❋ Unknown (2011)
A live webcast of both presentations can be accessed at photomasks.
Third quarter sales improved 7% from the sequential second quarter of fiscal 2010 as a result of increased demand for high-end integrated circuit and flat panel photomasks. ❋ Unknown (2010)
Utilized in a mix-and-match strategy, J-FIL's resolution and cost advantages can be deployed on specific critical layers, while its use of commercially available photomasks, exposure sources and resists makes for straightforward integration with the industry's existing optical lithography infrastructure. ❋ Unknown (2010)
Both papers represent the first published examples of DFEB mask technology being successfully deployed on advanced photomasks in fewer shot counts and less write-time than traditional e-beam writing techniques. ❋ Unknown (2010)
Together, photomasks with circular main features and curvilinear assist features can be shot efficiently. ❋ Unknown (2010)
SEMATECH and Carl Zeiss plan to design and develop the industry's first-ever actinic aerial image metrology system (AIMS) for defect review of EUV photomasks. ❋ Unknown (2010)
The strength in demand at the high-end for both FPD and IC photomasks continues to validate our strategy to deploy capital in these high growth markets. ❋ Unknown (2010)
The jointly developed system - called PROVE - demonstrated the measurement capability for advanced photomasks for the 32 nm node and below. ❋ Unknown (2010)
The system can be fully extended to measure EUV photomasks. ❋ Unknown (2010)
Sales of semiconductor photomasks were $244.5 million, or 77% of revenues for the first nine months of 2010, and sales of FPD photomasks were $71.0 million, or 23% of revenues. ❋ Unknown (2010)
The call can also be accessed by logging onto Photronics 'web site at photomasks. ❋ Unknown (2010)
